Subiksha Jayakumar

First Name: 
Subiksha
Last Name: 
Jayakumar
Mentor: 
Dr. Oliver Chyan
Abstract: 
In order to analyze the videos taken from the Linear Bias Sweep testing of electrochemical migration and gauge coating effectiveness, a surface-analysis tool to corroborate dendrite initiation time, quantify dendrite formation, and correlate dendrite growth with the applied current over a certain time was necessary. In order to address this, the IEMR Laboratory has developed the Metrology of Electrochemical Defect Analysis tool (MEDA) - a multi-purpose application designed to track relative change over time in a specified region of interest (ROI) within a video. Following a multi-step approach, MEDA is able to split a video into independent frames at a user-provided framerate with a user-specified ROI, process the images to filter any irrelevant background noise, analyze relative growth over time, and provide tables and charts correlating the measured Current and the percent change of dendrites over time.
Poster: 
ANALYSIS OF ELECTROCHEMICAL MIGRATION IN MICROELECTRONICS
Year: 
2021